Fingerprint Fingerprint is based on mining the text of the persons scientific documents to create an index of weighted terms, which defines the key subjects of each individual researcher.

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Plasmas Engineering & Materials Science
reactors Physics & Astronomy
energy distribution Physics & Astronomy
ions Physics & Astronomy
plasma etching Physics & Astronomy
atmospheric pressure Physics & Astronomy
radio frequencies Physics & Astronomy
etching Physics & Astronomy

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Grants 2008 2019

Research Output 1978 2018

Consequences of atomic layer etching on wafer scale uniformity in inductively coupled plasmas

Huard, C. M., Lanham, S. J. & Kushner, M. J. Mar 19 2018 In : Journal of Physics D: Applied Physics. 51, 15, 155201

Research output: Contribution to journalArticle

Inductively coupled plasma
Etching
etching
wafers
Fluxes

Downstream etching of silicon nitride using continuous-wave and pulsed remote plasma sources sustained in Ar/NF3/O2 mixtures

Huang, S., Volynets, V., Hamilton, J. R., Nam, S. K., Song, I. C., Lu, S., Tennyson, J. & Kushner, M. J. Mar 1 2018 In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 36, 2, 021305

Research output: Contribution to journalArticle

Plasma sources
Electric autotransformers
Inductively coupled plasma
Silicon nitride
silicon nitrides

Interaction of positive streamers in air with bubbles floating on liquid surfaces: Conductive and dielectric bubbles

Babaeva, N. Y., Naidis, G. V. & Kushner, M. J. Jan 1 2018 In : Plasma Sources Science and Technology. 27, 1, 015016

Research output: Contribution to journalArticle

liquid surfaces
floating
bubbles
air
interactions

Numerical study of the influence of surface reaction probabilities on reactive species in an rf atmospheric pressure plasma containing humidity

Schröter, S., Gibson, A. R., Kushner, M. J., Gans, T. & O'Connell, D. Jan 1 2018 In : Plasma Physics and Controlled Fusion. 60, 1, 014035

Research output: Contribution to journalArticle

fighter aircraft
Plasma interactions
plasma interactions
Plasma sources
Surface reactions
1 Citations

Atomic layer etching of 3D structures in silicon: Self-limiting and nonideal reactions

Huard, C. M., Zhang, Y., Sriraman, S., Paterson, A., Kanarik, K. J. & Kushner, M. J. May 1 2017 In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 35, 3, 031306

Research output: Contribution to journalArticle

Silicon
Etching
etching
silicon
Plasma etching